Surface Conductivity and Preferred Orientation of TiN Film for Ti Bipolar Plate

The properties of thin films are often influenced by the crystal’s preferred orientation. In present study, we report strong dependence surface conductivity on orientation TiN film that acts as coating material for Ti bipolar plate. is successfully controlled along (111) or (200) planes adjusting N2 flow rate substrate temperature during deposition process via DC (direct current) reactive magnetron sputtering. Small 3 to 6 sccm low (e.g., 25 °C) facilitates growth (111). orientated show much lower interfacial contact resistance (ICR) than films. A considerably ICR value 1.9 mΩ·cm2 at 140 N/cm2 achieved 4 and °C.